Author: Takeuchi, Y.
Paper Title Page
THPO126 Compact H+ ECR Ion Source with Pulse Gas Valve 955
SPWR037   use link to see paper's listing under its alternate paper code  
  • Y. Takeuchi, Y. Iwashita, H. Tongu
    Kyoto ICR, Uji, Kyoto, Japan
  We are developing a compact ECR H+ ion source with pulse gas valve. In the case of high current ion linac, the distance between the ion source and the first accelerating tube such as RFQ must be as short as possible to reduce the space charge effect, while operating in a high electric field a good vacuum condition is desirable. Since hydrogen gas always flows out from ion sources if the plasma chamber is filled with the gas, vacuum pumping systems have to evacuate the gas enough before the first accelerating tube. The pulse gas injection system achieved by a fast piezo gas valve can reduce the gas load on the vacuum evacuation system and is suitable for installing the ion source close to the RFQ.  
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About • paper received ※ 19 September 2018      issue date ※ 18 January 2019  
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