Author: Tan, W.W.
Paper Title Page
TUPO048 Study Progress of Pulse Laser Annealing for Niobium Film on Copper 438
SPWR021   use link to see paper's listing under its alternate paper code  
  • Y. Yang, B.T. Li, X.Y. Lu, W.W. Tan, L. Xiao, D. Xie, D.Y. Yang
    PKU, Beijing, People’s Republic of China
  Funding: Work supported by Major Research Plan of National Natural Science Foundation of China (No. 91026001).
The recent studies of laser annealing on niobium films on copper are reported. Annealing is normally used to deal with the surface, reducing defects and even chang-ing the microstructure of the coating film. Short pulse laser can produce a sharp step temperature field on the film thickness scale (μm), which anneals the surface without substrate heated. The laser annealing experi-ments of niobium thin film sample have been carried out, and according to SEM and FIB results, Nb films melted and recrystallization occurred. Grains growing up can be observed while the power density of laser pulse in-creased.
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About • paper received ※ 12 September 2018      issue date ※ 18 January 2019  
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