|TUPO048||Study Progress of Pulse Laser Annealing for Niobium Film on Copper||438|
|SPWR021||use link to see paper's listing under its alternate paper code|
Funding: Work supported by Major Research Plan of National Natural Science Foundation of China (No. 91026001).
The recent studies of laser annealing on niobium films on copper are reported. Annealing is normally used to deal with the surface, reducing defects and even chang-ing the microstructure of the coating film. Short pulse laser can produce a sharp step temperature field on the film thickness scale (μm), which anneals the surface without substrate heated. The laser annealing experi-ments of niobium thin film sample have been carried out, and according to SEM and FIB results, Nb films melted and recrystallization occurred. Grains growing up can be observed while the power density of laser pulse in-creased.
|DOI •||reference for this paper ※ https://doi.org/10.18429/JACoW-LINAC2018-TUPO048|
|About •||paper received ※ 12 September 2018 issue date ※ 18 January 2019|
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